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Titanium Target
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Titanium Sputtering Target for PVD Coating

Titanium Sputtering Target for PVD Coating

Brand Name: LHTi
Model Number: Titanium Target
MOQ: 100 pieces
Price: negotiable
Payment Terms: L/C,D/A,D/P,T/T,Western Union,
Supply Ability: 5000 Pieces Per Month
Detail Information
Place of Origin:
Baoji, Shaanxi, China
Certification:
ISO9001, CE, API,etc
Manufacturing Method:
Hot Isostatic Pressing (HIP)
Cable Length:
34 Inches
Grip:
Knurled
Target Color:
Red And White
Sample:
Available
Tensile Strength:
344 MPa
Resolution:
1080 X 2400 Pixels
Target Type:
Hunting
Powder Or Not:
Not Power
Density:
4.51 G/cm3
Material:
Titanium Alloy
Connectivity:
Bluetooth
Applications:
Semiconductor, Aerospace, Medical
Color:
Silver
Design:
Sleek
Packaging Details:
All goods are packed by seaworth shipment materials or required by buyer
Supply Ability:
5000 Pieces Per Month
Highlight:

Gr7 Titanium Target

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Silicon Sputtering Titanium Target

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PVD Vacuum Coating Machine Titanium Target

Product Description

Titanium Sputtering Target for PVD Coating

This titanium sputtering target is made from titanium metal and used to deposit titanium films by sputtering. It is produced by vacuum melting and casting, or by powder metallurgy with isostatic pressing and high-temperature sintering, in grades Gr1, Gr2, Gr5, Gr7 and Gr12 as well as alloy targets such as Ti-Al, Ti-Cr and Ti-Zr. The targets are forged and CNC machined with a density of 4.51 g/cm3 and a titanium content of 99.5% min, and are used in PVD coating, semiconductor, glass coating and surface coating processes.

Titanium sputtering target

Titanium target for PVD coating

Technical Specifications

Product name Titanium sputtering target
Grade Gr1, Gr2, Gr5, Gr7, Gr12; alloy targets Ti-Al, Ti-Cr, Ti-Zr
Titanium Content 99.5% min (pure titanium Gr1, Gr2: purity 99.6% min)
Impurity Content Less than 0.04%
Density 4.51 g/cm3
Standard ASTM B348, ASTM B381
Technique Forged and CNC machined
Color Silver

Available Target Sizes

Shape Size Range
Round target Ø30 - 2000 mm, thickness 3.0 - 300 mm
Plate target Length 200 - 500 mm, width 100 - 230 mm, thickness 3 - 40 mm
Tube target Dia 30 - 200 mm, thickness 5 - 20 mm, length 500 - 2000 mm
Custom sizes Available on request

Target Types and Applications

Target Type Typical Use
Pure titanium target Hardware, decoration, tools, ceramics, golf and other coating industries
Alloy target (Ti-Al, Ti-Cr, Ti-Zr) Film coating and surface coating, made to different proportions on request
Sputtering coating Semiconductor separation, storage electrode coating and glass coating industry

Applications & Titanium Advantages

Titanium sputtering targets are used for sputtering coating, surface coating and glass coating, and in the semiconductor, decoration, tool and ceramics industries. Titanium offers high purity, good corrosion resistance and stable film quality, so the deposited films are uniform and durable in demanding coating processes.

Quality, Customization & Inquiry

LHTi produces these targets to ASTM B348 and ASTM B381 and can supply alloy targets in different proportions to suit customer needs. Samples are available, and goods are packed in seaworthy shipment materials or as required by the buyer. Please send your drawing or specification for a quotation.