|Place of Origin:||China|
|Minimum Order Quantity:||10 pieces|
|Price:||US dollar $ 25.5/pc--US dollar $125/pc|
|Packaging Details:||Pearl cotton wrap or Sealed packaging，outside is standard Carton case or plywood case,or according your requirment to package|
|Delivery Time:||15-20 days|
|Payment Terms:||L/C, D/P, T/T, Western Union,paypal etc|
|Supply Ability:||5000 piece per week|
|Product Name:||Gr1 Gr2 TiAl TiCr TiCu Titanium Sputter Target For Coating Industry||Material:||Titanium,TiAl, TiNi, Cr, TiCr, TiZr, TiCu Etc.|
|Application:||Various Coating Industries, Such As Tool Coating, Optical Coating, Solar Energy Coating, Etc||Keyword 1:||Titanium Sputtering Target|
|Keyword 2:||TiAl Sputtering Target||Keyword 3:||Chrome Sputtering Target|
|Package:||Plywood Case Or According Your Requirment|
Coating Industry Titanium Sputter Target,
TiCu Cr Titanium Target,
Gr2 Titanium Sputter Target
Gr1 Gr2 TiAl TiCr TiCu Titanium sputter target for coating industry
Titanium targets/ titanium sputter target are widely used: when electronic components (such as common CD storage), semiconductor diodes, computer monitor liquid crystal film nanomaterials, military aerospace and other precision products, it is necessary to coat a layer of film on the surface to achieve corrosion resistance and wear resistance. Purpose, when the thickness of the film is in the micron and nanometer level, the traditional coating technology obviously cannot achieve this precision.
Product name: Titanium sputter target,TiAl sputtering target,TiCr sputtering target,TiCu sputtering target ,TiSi sputtering target,Zirconium sputtering target,Chrome sputtering target,Molybdenum sputtering target
Material:Gr1 Gr2 Gr5 titanium,TiAl, TiCr, TiCu,,TiSi,Mo,Cr etc.
The common size of the titanium sputter target :Φ100*40, Φ98*40,Φ95*45,Φ90*40, Φ85*35, Φ65*40 etc.
Also can customize according to customer' requests or drawings
Target requirements: high purity, uniform crystal grains, and good compactness.
Principle of vacuum coating:
The ions generated by the low-voltage and high-current ion source are accelerated in a vacuum to form a high-speed ion stream, bombard the solid surface, and exchange kinetic energy between the ions and the atoms on the solid surface, so that the atoms on the solid surface leave the target and deposit on the surface of the substrate. The formation of nanometer (or micrometer) film. The bombarded solid is the raw material for the deposition of thin films by sputtering, which is called sputtering material. Therefore, the target is a consumable.
Baoji Lihua Non-ferrous Metals Co., Ltd is an import and export company, established in 2006, located in Baoji City, which is known as " The Titanium Valley of China". With 15 years of production and export experience,the company is certified by ISO 9001:2015, and many of our products have passed third-party certification, such as TUV, BV, SGS tec. The titanium sputtering targets is produced according to international standards or according to customer requirements and drawings. The surface is clean and smooth, without peeling, folding, pores, cracks and other defects, with good chemical composition and physical properties. The quality has reached the export standard.
Each sputtering target is vacuum packed, and the outside is packed in standard export plywood cases.