|Place of Origin:||China|
|Minimum Order Quantity:||10 pieces|
|Price:||US dollar $ 25.5/pc--US dollar $125/pc|
|Packaging Details:||Pearl cotton wrap or Sealed packaging，outside is standard Carton case or plywood case,or according your requirment to package|
|Delivery Time:||15-20 days|
|Payment Terms:||L/C, D/P, T/T, Western Union,paypal etc|
|Supply Ability:||5000 piece per week|
|Product Name:||High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine||Material:||Pure Titanium, Titanium Alloy|
|Application:||Coating Industry, Sputtering Vacuum Coating Industry||Keyword:||Titanium Sputtering Target|
|Package:||Plywood Case Or According Your Requirment|
High Purity Titanium Sputtering Targets,
PVD Vacuum Coating Machine Titanium Target,
Pure Titanium Sputtering Targets
High Purity Titanium Sputtering Targets for PVD Vacuum Coating Machine
High purity titanium sputtering targets
|Product name||Titanium Sputtering Targets for pvd coating machine|
Titanium (Gr1, Gr2, Gr5, Gr7,GR12)
Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc
Other materials:chrome,zirconium,copper ,tungsten etc.
|Origin||Baoji city, Shaanxi Province,hina|
|Titanium content||≥99.5 (%)|
|Density||4.51 or 4.50 g/cm3|
|Standard||ASTM B348 , ASTM B381|
1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;
2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm
3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm
4. Customized is available
|Technique||Forged and CNC Machined|
|Application||Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry.|
Basic requirements for titanium sputtering targets:
In general, the following indicators will be considered when measuring whether the sputtering target meets the main requirements:
Purity: Purity has a great influence on the performance of the sputtered film. Take titanium target as an example, the higher the purity, the better the corrosion resistance, electrical and optical properties of the sputtered film.
Impurity content: impurities in the target solid and oxygen and water vapor in the pores are the main pollution sources of the deposition film. Different target materials have different requirements for their impurity content.
Density: The density of the target will not only affect the sputtering rate, but also affect the electrical and optical properties of the film. Therefore, in order to reduce the porosity in the target solid and improve the performance of the sputtered film, the target is usually required to have a high density.
Grain size and grain distribution: for the same target, the sputtering rate of fine grain target is faster than that of coarse grain target; The smaller the particle size difference (uniform distribution), the more uniform the thickness of the target sputtering deposition film.
Packaging: Each titanium target is packed in a customized vacuum plastic bag, filled with foam film and pearl cotton in the middle, and a fumigation-free plywood case outside. Comply with international transportation standards, to ensure that the goods are safe in transportation.
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