High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine

 High Purity Titanium Sputtering Targets for PVD Vacuum Coating Machine

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High purity titanium sputtering targets

Basic requirements for titanium sputtering targets:

In general, the following indicators will be considered when measuring whether the sputtering target meets the main requirements:

Purity: Purity has a great influence on the performance of the sputtered film. Take titanium target as an example, the higher the purity, the better the corrosion resistance, electrical and optical properties of the sputtered film.

Impurity content: impurities in the target solid and oxygen and water vapor in the pores are the main pollution sources of the deposition film. Different target materials have different requirements for their impurity content.

Density: The density of the target will not only affect the sputtering rate, but also affect the electrical and optical properties of the film. Therefore, in order to reduce the porosity in the target solid and improve the performance of the sputtered film, the target is usually required to have a high density.

Grain size and grain distribution: for the same target, the sputtering rate of fine grain target is faster than that of coarse grain target; The smaller the particle size difference (uniform distribution), the more uniform the thickness of the target sputtering deposition film.

Detailed images:

Packaging: Each titanium target is packed in a customized vacuum plastic bag, filled with foam film and pearl cotton in the middle, and a fumigation-free plywood case outside. Comply with international transportation standards, to ensure that the goods are safe in transportation.

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